Dear Colleagues,

Thick films (1–5 μm) can be grown for the creation of optical waveguides using deposition techniques, many of which have been developed for the creation of magnetic and semiconductor devices as well as optical coatings. With examples of materials and processing parameters, this chapter focuses on the principles and methods of thin-film processing. The fundamentals of physics, chemistry, and materials science are also stressed in order to understand the various elements that could eventually cause attenuation in a waveguide system. There are two primary categories of material deposition on a substrate: chemical vapor deposition (CVD) and physical vapor deposition (PVD) processes. The new pulsed laser deposition (PLD) process is a unique feature in thin-film fabrication, perfectly suited for optical quality film deposition. Examples and an explanation of the pertinent features are provided for each technique. The new pulsed laser deposition (PLD) process is a unique feature in thin-film fabrication, perfectly suited for optical quality film deposition. Examples and an explanation of the pertinent features are provided for each technique. Because of its intriguing surface features and numerous applications in fields ranging from microelectronics to optics, space science to aircraft, superconductivity to photovoltaic and solar cells, thin film technology is a prominent focus of scientific research in the modern world. The atomic structure, composition, microstructure, defects, and interfaces—all governed by the synthesis's kinetics and thermodynamics—all affect how well thin films perform. The ability to create flexible and transparent films, along with a simple and straightforward manufacturing procedure, are the main benefits of thin film fabrication. Deposition processes that are resilient, affordable, and highly efficient can be used to produce crystalline thin films that are compact, multi-colored, and of excellent quality. To create the appropriate thin films for the newest industrial and technological applications, there are numerous obstacles. The many thin-film methods, difficulties, and potential applications will be discussed in this section. Taking the lead in establishing "Fabrication of thin film" as a significant field within "thin films" is the primary goal of this section. The section's objective is to publish research articles and reviews that support experimental advancement, given its interdisciplinary structure and potential impact on scientific and technological development in nearly all fields. Interaction among scientists, interested in the thin films aspects of vnatural science, formal science, and life science, is made possible by the course

We invite seminal research articles and reviews in this field of study.

We anticipate hearing from you with your contributions.

Dr. Nidhi Asthana

Section Editor