Subnanophase coatings as new type low-dimensional nanomaterials: Ultra-high-vacuum synthesis, properties and application

Nikolay Pliusnin

Article ID: 1069
Vol 3, Issue 2, 2020

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Abstract


In this paper, a classification of low-dimensional nanomaterials is given, and new type of these nanomaterials — subnanophase coatings are proposed. Experimental results on the formation of a wetting layer of a transition metal on a silicon substrate by physical deposition in vacuum and results of this layer identification by the EELS method are given. Based on these results, a new approach to the formation of subnanophase coatings has been proposed by creation of an interface stresses structuring WL. The possible properties and application prospects of subnanophase coatings are considered.


Keywords


Low-dimensional Nanomaterials; Subnanophase Coatings; Wetting Layer; Ultrahigh-vacuum; Formation; Properties; Application

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References


1. Hannink RHJ, Hill AJ (editors). Nanostructure control of materials. Cambridge: Woodhead Publishing Limited, 2006. p. 368.

2. Voorhoeve RJH. Molecular beam deposition of solids on surfaces: Ultrathin films. In: Treatise on solid state chemistry. New York, London: Plenum Press; 1976. p. 241–342.

3. O’Connor DJ, Sexton BA. Smart RStC (editors). Surface analysis methods in material science. New York, Berlin: Springer Verlag; 1992. p. 480.

4. Oura K, Lifshits VG, Saranin AA, et al. Surface science: An introduction. Berlin: Springer Verlag; 2003. p. 440.

5. Henini M (editor). Molecular beam epitaxy: From research to mass production. London: Elsevier; 2012. p. 744.

6. Plusnin NI, Il’yashchenko VM, Krylov SV. Effect of incident atomic beam power on the formation of a Fe/Si(111)7×7 interface. Technical Physics Letters 2007; 33: 486–489.

7. Plusnin NI. Atomic-scale control of molecular-beam growth of nanolayers. In: Comprehensive guide for nanocoatings technology. Volume 2: Characterization and reliability. New York: Nova Science Publishers Inc; 2015. p. 87–102.

8. Plusnin NI, Tarima NA, Il’yashchenko VM, et al. The effect of underlayer-modified atomic monolayer on the mechanism of subsequent film growth. Technical Physics Letters 2012; 38: 324–327.

9. Plusnin NI. Application of AES and EELS for surface/interface characterization. Journal of Electron Spectroscopy & Related Phenomena 2004; 137: 161–164.

10. Plusnin NI. The use of AES and EELS for complex analysis of two-dimensional coatings and their growth process. Modern Electronic Materials 2017; 3: 131–141.

11. Plusnin NI. From physics of the interface formation to low-dimensional nanocoatings and nano-materials based on them. Vestnik of Far East Branch of Russian Academy of Science 2016; 4(188): 27–35. Available from: https://cyberleninka.ru/article/n/ot-fizki formirovaniya-granitsy-razdela-k-nizkorazmernym nanopokrytiyam-i-materialamna-ih-osnove.

12. Plusnin NI, Galkin NG, Lifshits VG, et al. Formation of interfaces and templates in the Si(111)-Cr system. Surface Review and Letters 1995; 2: 439–449.

13. Plusnin NI, Il’iashchenko VM, Kitan’ SA, et al. Metal thin-film nanophases and their interface with silicon. Journal of Physics Conference 2008; 100: 052094.

14. Plusnin NI, Il’yashchenko VM, Kitan’ SA, et al. Formation, electronic structure, and stability of film nanophases of transition metals on silicon. Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques 2009; 3(5): 734–746.

15. Plusnin NI. Atomic-scale AES-EELS analysis of structure-phase state and growth mechanism of layered nanostructures. Advances in Materials Physics and Chemistry 2016; 6: 195–210.

16. Plusnin NI. Metallic nanofilms on single crystal silicon: Growth, properties and applications. Modern Electronic Materials 2017; 3(2): 57–65.




DOI: https://doi.org/10.24294/can.v3i2.1069

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