Effect of Zn2+ Concentration on the Zinc Oxide Properties Prepared by Electrochemical Deposition

A. Henni; A. Karar; A. Merrouche; L. Telli

doi:10.24294/ace.v2i1.641

Effect of Zn2+ Concentration on the Zinc Oxide Properties Prepared by Electrochemical Deposition

A. Henni, A. Karar, A. Merrouche, L. Telli

Article ID: 641
Vol 2, Issue 1, 2019, Article identifier:

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Abstract

In this work, ZnO nanostructures are electrodeposited on ITO conducting substrate prepared from chloride baths. The influence of concentration of Zn²⁺ on the electrochemical characteristics has been studied using cyclic voltammetry (CV) and chronoamperometry (CA) techniques. The Mott–Schottky measurements demonstrate an n-type semiconductor character for all samples with a carrier density varying between 1.47 × 1,018 cm⁻³ and 3.14 × 1,018 cm⁻³. Scanning electron microscopy (SEM) show arrays of vertically aligned ZnO nanorods (NRs) with good homogeneity. X-ray diffraction spectra demonstrate that films crystalline with the Würtzite structure with preferential (002) crystallographic orientation having c-axis perpendicular to the substrate. The high optical properties of the ZnO NRs with a low density of deep defects was checked by UV-Vis transmittance analyses, the band gap energy of films varies between 3.3 and 3.4 eV with transparency around 80-90%.

Keywords

Electrochemical Growth; Zno; Nanorods; Thin Films; Zinc Concentration

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DOI: http://dx.doi.org/10.24294/ace.v2i1.641