Effect of Zn2+ concentration on the zinc oxide properties prepared by electrochemical deposition

Abdellah Henni1,2, A. Karar3, A. Merrouche1, L. Telli1

Article ID: 641
Vol 2, Issue 1, 2019, Article identifier:

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In this work, ZnO nanostructures are electrodeposited on ITO conducting substrate prepared from chloride baths. The influence of concentration of Zn2+on the electrochemical characteristics has been studied using cyclic voltammetry (CV) and chronoamperometry (CA) techniques. The Mott–Schottky measurements demonstrate an n-type semiconductor character for all samples with a carrier density varying between 1.47×1018 cm−3 and 3.14×1018 cm−3. Scanning electron microscopy (SEM) show arrays of vertically aligned ZnO nanorods (NRs) with good homogeneity. X-ray diffraction spectra demonstrate that films crystalline with the Würtzite structure with preferential (002) crystallographic orientation having c-axis perpendicular to the substrate. The high optical properties of the ZnO NRs with a low density of deep defects was checked by UV-Vis transmittance analyses, the band gap energy of films varies between 3.3 and 3.4 eV with transparency around 80-90 %.


Electrochemical growth; ZnO; Nanorods; Thin films; Zinc concentration

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DOI: http://dx.doi.org/10.24294/ace.v1i3.641


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