Comparison of Wet Deposition and Plasma Deposition of Aluminosilane Coatings

Abstract

Silane coatings are suitable for various applications of metal surfaces, such as forming a corrosion protection layer or as a primer for subsequent coating. In this work, bis-1,2- (triethoxy) ethane (BTSE) was used as a precursor on a 99.99% aluminum substrate for deposition of the coating, with three diff erent techniques: dipping (water-based solution ), Vacuum plasma and atmospheric plasma. (IRRAS), X-ray photoelectron spectroscopy (XPS) and fi eld emission gun scanning electron microscopy (FE-SEM) were used to characterize the structure, composition and surface morphology of silane coating. The purpose of this study is to compare the surface and body properties of membranes prepared by three different methods to obtain information on how BTSE molecules are modified by deposition techniques. The results show that in addition to the more traditional wet dip coating, the film can also be vacuum and atmospheric plasma deposition. The vacuum plasma deposition layer can be considered as an organic and inorganic mixture, which can be obtained by dipping as well as the silane layer. However, atmospheric plasma treatment leads to the formation of more inorganic fi lms containing Si-O. Photon spectroscopy and infrared spectroscopy showed the presence of Si-O-Si bonds, while IRRAS measurements showed Si-O-Si, Si-O-C, Si-O and Si-CH3 absorption bands.